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_Literature |
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Selected publications in international journals and conference proceedings about: resist dissolution, resist and polymer thermal analysis, polymer swelling under various chemical enviroments, using Single Wavelenght Interferometry and White Light Reflectance Interferometry.
For additional information or a copy of a paper, please send an e-mail to: info@thetametrisis.com |
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Publications in International Journals
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I.Raptis, D.Velesiotis, M.Vasilopoulou, P.Argitis Microelectron. Eng. 53 489(2000) “Development mechanism study by dissolution monitoring of positive methacrylate resists”
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N.Glezos, P.Argitis, D.Velessiotis, I.Raptis, M.Hatzakis, P.Hudek, I.Kostic J. Vac. Sci. Technol B18 3431(2000) “Aqueous base development and acid diffusion length optimisation in negative epoxy resist for electron beam lithography”
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I.Raptis Microelectron. Eng. 57-58 525(2001) “Free volume effects in resist lithographic performance”
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D.F.Stamatialis, M.Sanopoulou, I.Raptis J. Appl. Polym. Sci. 83 2823(2002) “Swelling and dissolution behavior of poly(methyl methacrylate) films in methyl ethyl ketone/methyl alcohol mixtures studied by optical techniques”
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I.Raptis, C.D.Diakoumakos Microelectron. Eng. 61-62 829(2002) “Non destructive method for monitoring glass transitions in thin photoresist films”
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M.Chatzichristidi, I.Raptis, C.D.Diakoumakos, N.Glezos, P.Argitis, M.Sanopoulou Microelectron. Eng. 61-62 729(2002) “Strippable aqueous base developable negative photoresist for high aspect ratio micromachining”
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M.Chatzichristidi, I.Raptis, P.Argitis J. Everett J. Vac. Sci. Technol. B20 2968(2002) “Partially hydrogenated poly(vinyl phenol) based photoresist for near UV, high aspect ratio micromachining”
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C.D.Diakoumakos, I.Raptis Polymer 44 251(2003) “In-situ monitoring of thermal transitions in thin polymeric films via optical Interferometry”
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I.Raptis, D.Niakoula, V.Bellas, E.Tegou, E.Gogolides, P.Argitis, K.G.Papadokostaki, A.Ioannidis Microelectron. Eng. 67-68 283(2003) “Resist process issues related to the glass transition changes in thin conventional and chemically amplified resist films”
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A.Olzierski, I.Raptis Microelectron. Eng. 73–74 244(2004) “Development and molecular weight issues on the lithographic performance of poly(methylmethacrylate)”
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D.Niakoula, I.Raptis, D.Goustouridis, P.Argitis Jpn. J. Appl. Phys. 43 5247(2004) “Glass transition temperature monitoring in bilayer and patterned photoresist films“
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S.Chatzandroulis, D.Goustouridis, I.Raptis Microelectron. Eng. 78-79 118(2005) “Polymeric film characterization for use in bimorph chemical sensors”
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D.Goustouridis, K.Manoli, S.Chatzandroulis, M.Sanopoulou, I.Raptis Sens. Act. B 111-112, 549(2005) ”Characterization of Polymer Layers for Silicon Micromachined Bilayer Chemical
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J.Raczkowska, A.Bernasik, A.Budkowski, P.Cyganik, J.Rysz, I.Raptis, P.Czuba Surf. Sci. 600 1004(2006) “Pattern guided structure formation in polymer films of asymmetric blends”
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S.Marceau, J.-H.Tortai, J.Tillier, N.Vourdas, E.Gogolides, I.Raptis, K.Beltsios, K.van Werden Microelectron. Eng. 83 1073(2006) “Thickness-dependent glass transition temperature of thin resist films for high resolution lithography”
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K.Manoli, D.Goustouridis, S.Chatzandroulis, I.Raptis, E.S.Valamontes, M.Sanopoulou, Polymer 47 6117(2006) “Vapor sorption in thin supported polymer films studied by white light interferometry”
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N.Vourdas, G.Karadimos, D.Goustouridis, E.Gogolides, A.G.Boudouvis, J.-H.Tortai, K.Beltsios, I.Raptis J. Appl. Polym. Sci. 102 4764(2006) “Multi-wavelength interferometry and competing optical methods for the thermal probing of thin polymeric films”
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J.Jaczewska, A.Budkowski, A.Bernasik, I.Raptis, J.Raczkowska, D.Goustouridis, J.Rysz, M.Sanopoulou J. Appl. Polym. Sci. 105 67(2007) “Humidity effects in spin-coated films of polythiophene-polystyrene blends”
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I.Raptis, J.Kovač, M.Chatzichristidi, E.Sarantopoulou, Z.Kollia, S.Kobe, A.C.Cefalas J. Laser Micro/Nanoengineering 2 200(2007) “Enhancement of sensing properties of thin poly(methyl methacrylate) films by VUV surface modification”
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M.Kitsara, K.Beltsios, D.Goustouridis, S.Chatzandroulis, I.Raptis Eur. Polymer J. 43 4602(2007) “Sequential polymer lithography for chemical sensor arrays”
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J.Jaczewska, I.Raptis, A.Budkowski, D.Goustouridis, J.Raczkowska, M.Sanopoulou, E.Pamuła, A. Bernasik, J.Rysz Synth. Met. 157 726(2007) “Swelling of poly(3-alkylthiophene) films exposed to solvent vapours and humidity: Evaluation of solubility parameters”
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A.Kokkinis, E.S.Valamontes, D.Goustouridis, Th.Ganetsos, K.Beltsios, I.Raptis Microelectron. Eng. 85 93(2008) “Molecular weight and processing effects on the dissolution properties of thin poly(methyl methacrylate) films”
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D.Drygiannakis, G.P.Patsis, K.vanWerden, A.Boudouvis, I.Raptis Microelectron. Eng. 85 955(2008) “Processing effects on the dissolution properties of thin chemically amplified photoresist films”
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E.Sarantopoulou, Z.Kollia, A.C.Cefalas, K.Manoli, M.Sanopoulou, D.Goustouridis, S.Chatzandroulis, I.Raptis Appl. Surf. Sci. 254 1710(2008) “Surface nano/micro functionalization of PMMA thin films by 157 nm irradiation for sensing applications”
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Presentations in International Conferences
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I.Raptis, D. Niakoula, E. Tegou, P. Argitis, E. Gogolides C. Cefalas, E. Sarantopoulou Int. Extreme UV Lithography (EUVL) Symp. (Texas, USA, 10/2002) “Resist Process Issues at EUV Related to the Glass Transition Changes Accompanying Film Thickness Reduction”
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D.Niakoula, I.Raptis, V.Bellas, P.Argitis Proc. SPIE 5039 357(2003) ”Glass transition temperature studies in thin photoresist films”
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D.Goustouridis, S.Chatzandroulis, I.Raptis, E.S.Valamontes IEEE Sensors 2004 (Vienna, Austria, 10/2004) “Modification of polymer swelling by UV irradiation for use in chemical sensing”
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A.Kokkinis, E.S.Valamontes, I.Raptis J. Phys. Conf. Ser. 10 401(2005) “Dissolution properties of ultrathin photoresist films for the fabrication of nanostructures”
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S.Chatzandroulis, D.Goustouridis, I.Raptis J. Phys. Conf. Ser. 10 297(2005) “Characterization of polymer films for use in bimorph chemical sensors”
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A.Kokkinis, D.Goustouridis, E.S.Valamontes, I.Raptis 5th Int. Conf. Polymer Surface Modification (Toronto, Canada, 06/2005) “Material and processing effects on the dissolution properties of thin resist films for high resolution lithography”
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D.Goustouridis, M.Kitsara, S.Chatzandroulis, K.Beltsios, I.Raptis EuroSensors 2005 (Barcelona, Spain, 09/2005) “A simple process for the deposition of polymer arrays for use in chemical sensing”
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N.Vourdas, G.Karadimos, E.Gogolides, A.G.Boudouvis, I.Raptis 4th Int. Conf. Instrumental Methods of Analysis (Iraklion, Greece, 10/2005) ”Evaluation of optical methods for the glass transition temperature measurement of thin polymeric films”
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K.Manoli, D.Goustouridis, S.Chatzandroulis, I.Raptis, M.Sanopoulou 4th Int. Conf. Instrumental Methods of Analysis (Iraklion, Greece, 10/2005) “Sorption of vapors in thin polymer films studied by white light interferometry”
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D.Niakoula, D.Drygiannakis, I.Raptis, G.P.Patsis, P.Argitis, E.Gogolides, V.P.Vidali, D.R.Gautam, E.A.Couladouros, W.Yueh, J.Roberts,
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R.Meagley MicroProcess & Nanotech Conf. (Kanagawa, Japan, 10/2006) “Dissolution studies of polycarbocycle-based aqueous base developable molecular resists”
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E.Sarantopoulou, Z.Kollia, K.Manoli, M.Sanopoulou, D.Goustouridis, S.Chatzandroulis, I.Raptis Transducers 2007 (Lyon, France, 06/2007) “Modification of sensing properties of thin polymer films by VUV irradiation”
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J.Jaczewska, A.Budkowski, J.Raczkowska, I.Raptis, D.Goustouridis IXth Int. Conf. Front. Pol. Adv. Mater. 2007 (Cracow, Poland 07/2007) “Swelling of Poly(3-alkylthiophene) films exposed to solvent vapors and humidity: effects of head to tail regioregularity”
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J.Jaczewska, A.Budkowski, J.Raczkowska, I.Raptis, D.Goustouridis 46th Microsymp. Nanostruct. Polym. & Polym. Nanocomp.(Prague, Czech Republic, 07/2007) “Swelling of Poly(3-alkylthiophene) films exposed to solvent vapors and humidity: effects of head to tail regioregularity”
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K.Manoli, E.Karonis, D.Goustouridis, S.Chatzandroulis, I.Raptis, M.Sanopoulou Instrumental Methods of Analysis (IMA 2007) (Patras, Greece, 10/2007) “A chemocapacitive sensor array for the detection of volatile compounds and humidity”
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M.Zavali, P.S.Petrou, S.Kakabakos, I.Raptis, K.Misiakos Instrumental Methods of Analysis (IMA 2007) (Patras, Greece, 10/2007) “Real time monitoring of biomolecular interactions by a label-free reflectance spectroscopy sensor”
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M.Chatzichristidi, E.Valamontes, I.Raptis, J.A.vanKan, F.Watt Microprocess & Nanotechnology Conf. (MNC 07) (Kyoto, Japan, 11/2007) “Realization and simulation of high aspect ratio micro/nano structures by proton beam writing”
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